Plasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors
نویسندگان
چکیده
Articles you may be interested in Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry Determination of the mechanical stress in plasma enhanced chemical vapor deposited SiO2 and SiN layers Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition
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